Monthly Archives: April 2007

Avoiding Litigation Over Your Confidential Intellectual Property

Posted on April 1, 2007 by wengirl6924

Guest Article By Brett Hertzberg, Regina Vogel Culbert and Ben ByerMerchant & Gould Disclosure of intellectual property and other confidential information is often necessary when negotiating with potential business partners or when seeking venture capital. But if this information is … Continue reading →

Posted in Intellectual_Property, Legal | Leave a comment

Dr. Dirk Weiss joins WTC as senior research scientist

Posted on April 1, 2007 by wengirl6924

As a senior research scientist with Washington Technology Center, Dirk Weiss assumes responsibility for the DARPA-funded nanolithography project. Dirk’s graduate degrees are in physics and materials science from Freie Universität Berlin and Max-Planck-Institute for Metals Research (Stuttgart, Germany), respectively. He … Continue reading →

Posted in DARPA, MEMS_and_Nanotechnology, Microfabrication_Lab, WTC_News | Leave a comment

Discover WSU – April 10, 2007 in Pullman, Wash.

Posted on April 1, 2007 by wengirl6924

A networking event for companies and WSU researchers seeking research & development opportunities. Converting cutting-edge research into commercial products is critical to the economic vitality of Washington state. At Washington State University, this technology transfer is happening thanks to strong … Continue reading →

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Academic Leader Alex K-Y. Jen Appointed to WTC Board

Posted on April 1, 2007 by wengirl6924

Governor Chris Gregoire recently appointed Professor Alex K-Y. Jen, of the University of Washington to the Washington Technology Center (WTC) board of directors. Jen, Boeing-Johnson Chair Professor in the Department of Materials Science & Engineering, came to University of Washington … Continue reading →

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Emerging Developments in Nanoscale Lithography

Posted on April 1, 2007 by wengirl6924

Article by Dr. Dirk Weiss, Senior Research Scientist, Washington Technology Center As the Complementary Metal–Oxide Semiconductor (CMOS) industry transitions in 2007 from 65-nanometer to 45-nanometer structures, emerging developments in extreme ultraviolet (EUV) lithography and nanoimprint lithography (NIL) may advance the … Continue reading →

Posted in MEMS_and_Nanotechnology, Microfabrication_Lab | Leave a comment