Monthly Archives: October 2001

Washington Technology Center gathers photonics professionals for workshop

Posted on October 24, 2001 by wengirl6924

For Immediate Release: October 24, 2001 Seattle – “Photonics 2001: Wavelengths of the Future,” the Washington Technology Center’s fifth annual technology initiative workshop is set for Tuesday, October 30, 2001 in Bellevue. Photonics is the set of technologies used to … Continue reading →

Posted in Events, MEMS_and_Nanotechnology, WTC_News | Leave a comment

Washington Technology Center leads consortium in winning SBA FAST award

Posted on October 8, 2001 by wengirl6924

For Immediate Release: October 8, 2001 Seattle – A consortium of eight organizations from around the state, led by Washington Technology Center, was awarded a $100,000 matching grant from the U.S. Small Business Administration under their Federal and State Technology … Continue reading →

Posted in Funding, Quote-WTC, SBIR, WTC_News | Leave a comment

WTC awards new FTI project

Posted on October 3, 2001 by wengirl6924

In addition to the Research and Technology Development (RTD) program, WTC has two programs that facilitate fast-track industry-university research collaborations. The Entrepreneur’s Access (EA) and Focused Technology Initiative (FTI) programs are ideally suited to assist small businesses and startup enterprises … Continue reading →

Posted in Bio~OriGyn, Funding, Life_Sciences, RTD | Leave a comment

WTC’s year in review: highlights of the 2000-2001 annual report

Posted on October 3, 2001 by wengirl6924

Our role at WTC is to foster collaborative efforts among Washington companies and the state’s institutions of higher education leading to economic growth. We continued to enhance those relationships in a variety of ways. WTC’s investments show results Our annual … Continue reading →

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Microfabrication Laboratory news

Posted on October 3, 2001 by wengirl6924

Silicon nitride process available on LPCVD WTC’s Microfabrication Laboratory is now offering users a new process for thin film deposition of dielectric material. A silicon nitride (Si3N4) process has been brought up on the lab’s Low Pressure Chemical Vapor Deposition … Continue reading →

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