The capabilities of the Microfabrication Laboratory were strengthened as the result of two equipment donations from industrial sources:
Intel has provided the Microfab Lab with an AMRAY 3800 scanning electron microscope (SEM) from their R&D facility in Hillsboro, OR. The SEM can accommodate wafers up to 8″ in diameter, and the stage tilts 45º to allow full scanning of processed wafers without repositioning. In addition, the SEM has an EDAX (energy-dispersive x-ray analysis) system that permits chemical identification of materials being imaged. The AMRAY SEM represents a valuable addition to the suite of inspection and characterization tools available in the Lab.
Trion Technology has donated a Mini-Lock II reactive ion etching (RIE) system to the Lab. This plasma etching tool is a state-of-the-art version of the Lab’s current Trion Phantom RIE system, and includes an inductively-coupled plasma (ICP) source to increase etching performance, a load lock to minimize the etch chamber’s exposure to atmosphere, and an electrostatic chuck for secure wafer hold-down during processing. The new RIE will allow a new range of materials to be plasma-etched, at enhanced rates, and with improved precision. The system is expected to be on line in April.
Related WTC links:
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